Alignment mark system for mass transport processes
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United States of America Patent
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-
May 4, 2004
Grant Date -
May 30, 2002
app pub date -
Nov 29, 2000
filing date -
Nov 29, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A technique for creating alignment feature in mass transported substrates yields alignment features that can be located with high degrees of accuracy. Specifically, structures such as concave or convex lenses are created that yield a light pattern in transmission or reflection when the part of the substrate is imaged or a plane near the substrate is imaged. This light pattern is then used to align the substrate during subsequent lithography or packaging processes.
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