Azo dyes and azo-metal complexes for atomic force microscope lithography
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United States of America Patent
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Apr 6, 2004
Grant Date -
Mar 6, 2003
app pub date -
Aug 8, 2002
filing date -
Aug 9, 2001
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Expired
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Abstract
This invention relates to nano-lithography with .pi.-conjugated azo dyes and azo-metal complexes represented by formula 1 or formula 2(Korea Pat. Appln. Nos. 2001-6879.about.6880), which has both electron-donating and electron-accepting groups in the molecular structures, as a resist on Si substrate by using an AFM anodization. lithography. Developing optimum conditions of scan speed, bias voltage, and resist materials are key issues for achieving a high resolution patterning on various substrates. We accomplished nanometer-scale patterning in approximately 35 nm dimensions.
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