Method of producing silica micro-structures from x-ray lithography of SOG materials
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United States of America Patent
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Mar 30, 2004
Grant Date -
N/A
app pub date -
Dec 14, 2001
filing date -
Dec 14, 2000
priority date (Note) -
Expired
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Abstract
A lithographic method for producing high aspect ratio silica micro-structures having the steps of: providing a carrier substrate with a confinement boundary placed on the carrier substrate; placing the SOG material within the confinement boundary and soft baking at a temperature above its glass transition temperature; forming a pattern of interest on the soft baked SOG material by x-ray lithography; and heating the SOG material until it is substantially converted to a silica-like oxide.
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- 21 Age