Method and apparatus for scanning semiconductor wafers using a scanning electron microscope
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United States of America Patent
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Mar 23, 2004
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N/A
app pub date -
Sep 22, 2000
filing date -
Sep 22, 2000
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Abstract
An apparatus and method for scanning the surface of a specimen is disclosed for defect inspection purposes. Scanning Electron Microscope (SEM) is used to scan the surface of a specimen. The scanning method employed by the SEM comprises the steps of: generating a particle beam from a particle beam emitter, and scanning the surface of the specimen by deflecting the particle beam at an angle with respect to the surface of the specimen, wherein the particle beam traverses an angle that is not parallel or perpendicular to the orientation of the specimen. The specimen being scanned is a semiconductor wafer or a photo mask.
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