Pattern generator using EUV
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United States of America Patent
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Feb 3, 2004
Grant Date -
N/A
app pub date -
Aug 31, 2000
filing date -
Mar 2, 1998
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Abstract
The present invention relates to an apparatus for creating a pattern with extremely high resolution on a workpiece, such as a pattern on a semiconductor chip. The apparatus comprises a source for emitting electromagnetic radiation in the EUV wavelength range, a spatial modulator (SLM) having a multitude of pixels, an electronic data processing and delivery system receiving a digital description of the pattern to be written, extracting from it a sequence of partial patterns, converting said partial patterns to modulator signals, and feeding said signals to the modulator, and a precision mechanical system for moving said workpiece and/or projection system relative to each other. It further comprises an electronic control system coordinating the movement of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is stitched together from the partial images.
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