Objective with crystal lenses and projection exposure equipment for microlithography
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United States of America Patent
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Jan 27, 2004
Grant Date -
N/A
app pub date -
Nov 30, 1999
filing date -
Nov 30, 1998
priority date (Note) -
Expired
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Abstract
An objective with lenses made of two different crystals, in particular CaF.sub.2 and BaF.sub.2 is particularly suitable as a refractive projection objective for microlithography at 157 nm. Such projection objectives for 193/248 nm with quartz glass and achromatization with CaF.sub.2 are compaction-resistant with BaF.sub.2. Microlithography projection exposure equipment in the 100-200 nm wavelength region include other fluorides and partially catadioptric objectives.
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