Uniform gas distribution in large area plasma source
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United States of America Patent
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Jan 27, 2004
Grant Date -
N/A
app pub date -
Mar 29, 2002
filing date -
Sep 29, 1999
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Expired
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Abstract
An apparatus configured to generate a time-varying magnetic field through a field admission window of a plasma processing chamber to create or sustain a plasma within the chamber by inductive coupling. The apparatus includes a magnetic core presenting a pole face structure,--an inductor means associated with the magnetic core, arranged to generate a time-varying magnetic field through the pole face structure, and--a device for injecting gas into the chamber and through the chamber and through the magnetic core.
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