Critical dimension measurement method and apparatus capable of measurement below the resolution of an optical microscope
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United States of America Patent
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Jan 20, 2004
Grant Date -
Oct 10, 2002
app pub date -
Feb 26, 2002
filing date -
Feb 28, 2001
priority date (Note) -
Expired
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Abstract
A critical dimension measurement method and apparatus capable of measurement even for a object below a resolution of an optical microscope. An image of an object is picked up by using an optical microscope and an image sensor. From an obtained video signal, signal positions of two points coinciding with a predetermined luminance level are extracted. A difference in position between the two points is multiplied by a ratio of maximum luminance between the two points to maximum luminance serving as a reference. On the basis of a resultant product, a size of the object is measured.
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