Method of making self-cleaning substrates
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United States of America Patent
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Jan 20, 2004
Grant Date -
Aug 28, 2003
app pub date -
Feb 22, 2002
filing date -
Feb 22, 2002
priority date (Note) -
Expired
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Abstract
A photocatalytically-assisted self-cleaning ('PASC') coating on a substrate enables the substrate to shed dirt simply by rinsing with water. A method of making a PASC coating includes depositing by chemical vapor deposition an alkali metal diffusion barrier layer on a substrate; sputtering an ultraviolet radiation activated layer on the alkali metal diffusion barrier layer at a temperature of 100.degree. C. or less; and, without heating above 100.degree. C., exposing the ultraviolet radiation activated layer to ultraviolet radiation to form the self-cleaning substrate. The sputter deposition of the ultraviolet radiation activated layer on the chemical vapor deposited alkali metal diffusion barrier layer allows the ultraviolet radiation activated layer to be activated upon exposure to UV radiation without first having been heated during and/or after deposition. The elimination of this step of heating the ultraviolet radiation activated layer results in significant process simplification and cost reduction.
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