Methods and apparatus for electron beam inspection of samples
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 13, 2004
Grant Date -
N/A
app pub date -
Oct 8, 2002
filing date -
Aug 27, 2002
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Methods and apparatus are providing for inspecting a test sample. An electron beam is tuned to cause secondary electron emissions upon scanning a target area. Reactive substances are introduced to etch and remove materials and impurities from the scan target. Residual components are evacuated. In one example, a laser is used to irradiate and area to assist in the removal of residual components with poor vapor pressure.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully