Microwave enhanced CVD method and apparatus

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United States of America Patent

PATENT NO 6677001
SERIAL NO

08470596

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Abstract

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A new chemical vapor reaction system is described. Instead of ECR where electrons can move as independent particles without interaction, a mixed cyclotron resonance is a main exciting principal for chemical vapor reaction. In the new proposed resonance, the resonating space is comparatively large so that a material having a high melting point such as diamond can be deposited in the form of a thin film by this inovative method.

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SEMICONDUCTOR ENERGY LABORATORY CO LTDJAPAN'S KANAGAWA PREFECTURE ATSUGI CITY ATSUGI-SHI KANAGAWA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirose, Naoki Atsugi, JP 48 1792
Inujima, Takashi Atsugi, JP 35 1500
Tashiro, Mamoru Tokyo, JP 16 269
Yamazaki, Shunpei Tokyo, JP 7534 239327

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