Treatment of hazardous gases in effluent
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United States of America Patent
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Jan 6, 2004
Grant Date -
N/A
app pub date -
Mar 24, 2000
filing date -
Mar 24, 2000
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Abstract
A method for reducing hazardous gases exhausted from a process chamber includes an effluent gas treatment system with a gas energizing reactor and an additive gas source. Additive gas comprising reactive gas is introduced into the effluent from the process chamber in a volumetric flow rate in relation to the hazardous gas content in the effluent.
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