Method for reactive ion etching and apparatus therefor
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United States of America Patent
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Dec 30, 2003
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Jan 31, 2002
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Sep 22, 1997
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Abstract
An apparatus for reactive-ion etching including a reaction vessel and metallic parts disposed in the reaction vessel, the whole or a part of which includes at least one metallic material selected from the group consisting of titanium, aluminum, and an alloy including at least one of them as a main component.
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