Detection method of coating film thickness and ion implantation equipment using this method
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United States of America Patent
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Dec 16, 2003
Grant Date -
N/A
app pub date -
Aug 3, 2000
filing date -
Aug 5, 1999
priority date (Note) -
Expired
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Abstract
A detection method of coating film thickness and an ion implantation equipment using the detection method. The detection method comprises providing on a surface of materials, such as disk (11) of a wafer support on which a coating film comprising a low conductive material, an electrical measurement sensor (18) having a coating film comprising the same material, and detecting thickness change of the coating film on the surface of the materials by irradiation with particle beams in the form of a signal from the sensor (18). The ion implantation equipment comprises an electrical measurement sensor provided on a disk and having a sample piece that forms a coating film of the same material as that of a surface coating of the disk, and means to monitor thickness change of the coating film by sensor signal from the measurement sensor.
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