Plasma processing device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Dec 2, 2003
Grant Date -
Mar 28, 2002
app pub date -
Jun 13, 2001
filing date -
Jun 14, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
To uniformly generate plasma using microwaves in a processing vessel. To first to fourth feeding sections 141a to 141d which are evenly placed on the same plane perpendicular to an axial direction of a main coaxial line 123, four microwaves shifted in phase by 0.degree., 90.degree., 180.degree., and 270.degree. are fed from first to fourth microwave supply sections 142a to 142d.
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