Oled panel with anti-glare polyimide pixel defining layers and photoresist ram parts
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United States of America Patent
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Nov 25, 2003
Grant Date -
N/A
app pub date -
Feb 15, 2001
filing date -
Apr 26, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for forming a pixel-defining layer on an OLED panel comprises the following steps: (A) providing a substrate; (B) forming plurality of electrodes on the substrate; (C) coating a layer of anti-glare compositions comprising non-photosensitive polyimide and light-absorbing pigments or dyes on the substrate; (D) first prebaking the substrate with the layer of the anti-glare compositions; (E) coating a layer of photoresist compositions on the layer of anti-glare compositions; (F) second prebaking the substrate with the anti-glare compositions and the photoresist; (G) forming patterns of the photoresist through exposing the substrate to masked radiation, developing the photoresist on the substrate, etching the layer of the anti-glare compositions and the photoresist at the same time to form patterned layers of the anti-glare polyimide or polyimide precursor compositions and patterned photoresist; and (I) baking the substrate with the patterned anti-glare polyimide or polyimide precursor compositions for crosslinking or curing to form the anti-glare pixel-defining layers.
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