Process for preparing polymer compound for resist
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 25, 2003
Grant Date -
N/A
app pub date -
Aug 16, 2002
filing date -
Apr 4, 2001
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
There is provided a process for preparing a polymer compound for a resist, which can improve the performance, such as the heat resistance, sensitivity and resolution of the resist, without causing film loss of the resist, line width reduction of the resist or deterioration of the dry etching resistance of the polymer. This process comprises dissolving a styrene-based monomer containing at least a 4-acetoxystyrene monomer, and a dimethyl-2,2'-azobiscarboxylate ester in a solvent, thereby to polymerize the styrene-based monomer; adding an alkali catalyst to the resulting polymer solution, thereby to hydrolyze the polymer solution; and washing the resulting polymer compound with water.
First Claim
Other Claims data not available