Heat-developable photosensitive material

United States of America Patent

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Nov 18, 2003
Grant Date
Aug 8, 2002
app pub date
Nov 15, 2001
filing date
Nov 17, 2000

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Expired

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Abstract

A heat-developable photosensitive material comprises: a support; a photosensitive silver halide; a non-photosensitive organic silver salt; a reducing agent for a silver ion; a binder; and a compound having specified structure.

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Patent Owner(s)

Patent Owner	Address
FUJIFILM CORPORATION	26-30 NISHIAZABU 2-CHOME MINATO-KU TOKYO 106-8620

International Classification(s)

G03C:PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Hioki, Takanori	Kanagawa, JP	97	433
Kobayashi, Katsumi	Kanagawa, JP	171	1469

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Heat-developable photosensitive material

Number of patents in Portfolio can not be more than 2000

United States of America Patent

09987620

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PATENT NO	6649337
APP PUB NO	20020106594A1
SERIAL NO	09987620
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
November 18, 2003	US,6649337,B2 US6649337B2	GRANTED PATENT AS SECOND PUBLICATION
August 08, 2002	US,20020106594,A1 US20020106594A1	FIRST PUBLISHED PATENT APPLICATION

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09987620

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