Thinner for rinsing photoresist and method of treating photoresist layer
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United States of America Patent
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Nov 11, 2003
Grant Date -
May 15, 2003
app pub date -
Jun 25, 2002
filing date -
Dec 24, 1999
priority date (Note) -
Expired
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Abstract
A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions thereof and associated waste water are easily handed so as to render this thinner environmental friendly. Additionally, the photoresist thinner of the present invention has excellent rinsing ability.
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