Ion source
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 11, 2003
Grant Date -
Jul 18, 2002
app pub date -
Aug 9, 2001
filing date -
Nov 30, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An ion source for use in ion assisted deposition of films, has an ionization region, a gas supply supplying ionizable gas to the ionization region, a gas excitation system causing ionization of the gas, ion influencing means forming the ions into a current directed at a target, and an ion source controller controlling the ion source so as to intermittently produce the ion current.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully