Stain removal pen with optimal application device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 11, 2003
Grant Date -
Feb 20, 2003
app pub date -
Jan 8, 2002
filing date -
Jul 12, 1999
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An applicator for a fabric treatment to effect mechanical stain removal has a no rinse fabric treatment composition and an application device. The application device induces a certain frictional stress upon the fabric and has a frictional stress value on the fabric optimally chosen to effect fabric treatment and is at the same time kind to the fabric. Advantageously, the application device has a frictional stress value of from 0.05 N mm.sup.-2 to 1 N mm.sup.-2. The frictional stress should be high enough to ensure good mechanical stain removal, good delivery of the fabric treatment composition into the fabric and allow fabric treatment with fabric friendly chemical compositions at low levels.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully