Plasma processing apparatus with real-time particle filter
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United States of America Patent
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Oct 28, 2003
Grant Date -
N/A
app pub date -
Aug 23, 2000
filing date -
Jul 7, 2000
priority date (Note) -
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Abstract
In the plasma processing device which utilizes a low pressure arc discharge, a method for efficiently capturing and removing electrically charged particles and neutral particles having no charge which are at most 5 .mu.m in particle diameter is demanded. The electrically charged particles can be captured efficiently by installing an electric field filter in a transportation course of plasma. The electric field filter has a cylindrical structure which is uneven in inner wall shape. A voltage in the range of 10 to 90 V is applied to the electric field filter. The neutral filters can be captured efficiently by installing a neutral filter having an opening sectional area which is at most 40% of a sectional area of the transportation course.
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