Semiconductor wafer cleaning apparatus and method
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United States of America Patent
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Oct 28, 2003
Grant Date -
May 8, 2003
app pub date -
Dec 23, 2002
filing date -
Jul 10, 1995
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A semiconductor wafer cleaning apparatus comprises an outer tank, a cleaning tank provided within the outer tank, a wafer carrier provided within the cleaning tank, a plurality of jet nozzles directed toward the wafer carrier, a main pipe connected to the jet nozzles, a circulating pump connected to the main pipe and the outer tank for circulating a cleansing solution from the outer tank, through the main pipe, the jet nozzles, and the cleaning tank, and a filter for filtering the circulated cleansing solution.
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