Print quality test structure for lithographic device manufacturing
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 21, 2003
Grant Date -
N/A
app pub date -
Sep 22, 2000
filing date -
Sep 22, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Disclosed is a print quality test structure for devices manufactured by lithography. The test structure allows for visual inspection of the print quality of the device. The test structure decouples the effects of overexposure, underexposure and focus so that corrections can be made for future device manufacturing. By visually inspecting each device during lithography, devices of poor quality can be reworked, and costly testing on all devices can be avoided through device screening.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully