Lithographic apparatus, device manufacturing method, and device manufactured thereby

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United States of America Patent

PATENT NO 6633366
APP PUB NO 20020054284A1
SERIAL NO

09925723

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Abstract

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Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.

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Patent Owner(s)

Patent OwnerAddress
AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE LIMITED1 YISHUN AVENUE 7 SINGAPORE 768923

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bleeker, Arno Jan Steenovens 67, Westerhoven, NL 5563 CE 99 3022
de, Jager Pieter Willem Herman Buitenbassinweg 142, Rotterdam, NL 3063 TB 85 1247
Kruit, Pieter Koornmarkt 49, Delft, NL 2611 EB 103 1318
van, der Mast Karel Diederick Geeneindseweg 7, Helmond, NL 5708 BB 28 879

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