Apparatus and method for processing a substrate
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United States of America Patent
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Oct 14, 2003
Grant Date -
N/A
app pub date -
Aug 4, 2000
filing date -
Aug 5, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A lamp house is located face to face with a substrate which is transferred by a conveyer means. A dielectric barrier discharge lamp is provided in the lamp house to irradiate the substrate with ultraviolet light, while a moistened inert gas, consisting of an inert gas and water vapor, is supplied to a space between the substrate and the dielectric barrier discharge lamp from a moistened inert gas generating means. Under irradiation of ultraviolet light from the dielectric barrier discharge lamp, water vapor in the moistened inert gas is split into a reducing active member [H.multidot.] and an oxidative active member [.multidot.OH].
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