Apparatus and method for measuring and monitoring complexpermittivity of materials
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United States of America Patent
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Sep 9, 2003
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N/A
app pub date -
Nov 22, 2000
filing date -
Nov 22, 2000
priority date (Note) -
Expired
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Abstract
A highly accurate instantaneous numerical analysis software assists on on-line and nondestructive in situ measurement method and instrument for the measurement of complex permittivity of materials in solid, semisolid, granular, sheet, thin and thick films, as well as materials in the liquid state. Such materials may include ceramics, polymer, semiconductor, or dielectric materials used in a circuit board and integrated Circuit manufacturing materials. The measuring instrument is a near field, non-contract apparatus in the form of one from the group of microstrip, coplanar waveguide and asymmetric inhomogeneous stripline. The frequency range may be 50 MHz onwards. The instrument includes a sweep oscillator, a resonator, a detector, a power meter to measure transmitted power with respect to the input signal frequency, a computer and an interface device. The instrument and method works on the basis of analysis of electromagnetic equations along with the measurement of Q factor and shift in the frequency of resonance due to the presence of material under test in the known vicinity of the resonation.
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