Organic polymers for bottom antireflective coating, process for preparing the same, and compositions containing the same
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United States of America Patent
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Aug 26, 2003
Grant Date -
Apr 17, 2003
app pub date -
Oct 15, 2001
filing date -
Aug 30, 2001
priority date (Note) -
Expired
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Abstract
A bottom antireflective coating layer is made from the compositions of organic photosensitive materials that contain isoflavone chromophore by photolithography utilizing a deep ultraviolet light source for producing a submicro-level, large-scale integrated chip. A copolymer containing an isoflavone chromophore is used as a bottom antireflective coating layer for fabricating a 64-megabit or gigabit DRAM. The antireflective coating layer enables not only the suppression of reflections of light that occur under the substrate layer but also the removal of standing waves. Consequently, a high-resolution sub-micron of a 100.about.200 nm integrated circuit is able to be stably formed. Therefore, it is possible to increase the production of semiconductors.
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