Electron beam lithography system and method
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United States of America Patent
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Aug 12, 2003
Grant Date -
May 15, 2003
app pub date -
Nov 9, 2001
filing date -
Nov 9, 2001
priority date (Note) -
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Abstract
In an electron beam lithography system, an outputted main signal is applied directly to deflection plates, whereas an outputted auxiliary signal is applied to the deflection plate through a capacitive coupling for writing a wide strip-like pattern accurately at a high speed. In the electron beam lithography system, a deflection signal is divided into a main signal having a low frequency and a large amplitude and an auxiliary signal having a high frequency and a small amplitude. The main signal is applied directly to deflection plates, and the auxiliary signal is applied to the deflection plate through a capacitor. In the case of writing a straight line having a certain width, and a solid graphic pattern, because the electron beam is deflected in a given direction and a given width by the use of the auxiliary signal in synchronism with one sweeping cycle based on the main signal, a line whose width is as wide as may times of the electron beam diameter can be written, and a graphic pattern having a certain width can be written at a high speed.
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