Developing solution for a photoresist and a method for developing the photoresist
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 5, 2003
Grant Date -
Sep 19, 2002
app pub date -
Jan 3, 2002
filing date -
Jan 12, 2001
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Developing solution for a photoresist comprising an alicyclic amine compound and a non-metallic alkali compound is described. The developing solution exhibits excellent wettability and dissolution selectivity to alicyclic compound-based resists. Also, the developing solution does not produce dissolution residues, and it makes it possible to reliably form ultra fine patterns.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully