Plasma coil
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United States of America Patent
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Jul 22, 2003
Grant Date -
Jun 5, 2003
app pub date -
Nov 30, 2001
filing date -
Nov 30, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Various embodiments of a plasma coil, methods of making the same, a processing apparatus utilizing plasma processes and methods of manufacture are disclosed. In one aspect, a plasma coil is provided that includes a first conductor coil that has a plurality of turns. An innermost of the plurality of turns terminates to define a central void portion and an outermost of the plurality of turns defines a peripheral portion. A first conductor plate is positioned in the central void portion of and coupled in series to the first conductor coil. The conductor plate provides a more uniform and intense electrical field in order to retard residue formation on plasma chamber windows.
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