Silicon-containing polymer and bilayer resist composition based thereon
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United States of America Patent
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-
Jul 22, 2003
Grant Date -
Nov 21, 2002
app pub date -
May 10, 2002
filing date -
May 11, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Polymeric compounds for use in a chemically amplified resist are represented by the following chemical formulas 1 and 2: ##STR1## wherein R.sub.1 and R.sub.2, which may be identical or different, are each selected from the group consisting of --H and --CH.sub.3 ; R.sub.3 and R.sub.4, which may be identical or different, are each selected from the group consisting of --H, --CH.sub.3 and --CH.sub.2 CH.sub.3 ; and 0.1.ltoreq.m.ltoreq.0.9 and 0.1.ltoreq.n.ltoreq.0.9, with the equation of m+n=1. ##STR2## wherein R.sub.3, R.sub.4, and R.sub.5, which may be identical or different, are each selected from the group consisting of --H and --CH.sub.3 ; R.sub.6 and R.sub.7, which may be identical or different, are each selected from the group consisting of --H, --CH.sub.3 and --CH.sub.2 CH.sub.3 ; R.sub.8 is --CH.sub.3 or --CH.sub.2 CH.sub.2 OH; and 0.1.ltoreq.p.ltoreq.0.9, 0.05.ltoreq.q.ltoreq.0.8, and 0.05.ltoreq.r.ltoreq.0.5, with the equation of p+q+r=1.
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