Method for fabricating optical devices with defectless and antireflecting spot size converter
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United States of America Patent
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Jul 22, 2003
Grant Date -
Oct 17, 2002
app pub date -
Mar 4, 2002
filing date -
Mar 5, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention relates to a method for fabricating an optical device integrated with a spot size converter to reduce defect and low reflectivity in a butt-joint portion, the method including the steps of: a) depositing a first clad layer, an active layer and a second clad layer sequentially on the (100) plane of a semiconductor substrate; b) forming on the second clad layer a double dielectric mask of which the lower layer has a relatively wider width than that of the upper layer, exposing one side of the second clad layer; c) wet-etching the first clad layer, the active layer and the second clad layer in a buried ridge structure by using the double dielectric mask, and exposing the (111)A plane of the active layer tilted towards the (100) plane by a predetermined angle; d) growing a spot size conversion region on the (111)A plane of the active layer; and e) removing the double dielectric mask.
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