Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
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United States of America Patent
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Jul 22, 2003
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N/A
app pub date -
Apr 11, 2002
filing date -
May 29, 2001
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Abstract
Copolymers containing the units A, B, C, D and optionally E are used to prepare radiation sensitive compositions and lithographic printing plates. The copolymer contains about 25 to 55 mol % of unit A which has the formula ##STR1## The copolymer contains about 0.5 to 25 mol % of unit B which has the formula ##STR2## wherein R.sup.1 is selected from the group consisting of alkyl, aryl and aralkyl. The copolymer contains about 0.5 to 40 mol % of unit C which has the formula ##STR3## wherein X is an aliphatic or aromatic spacer group, and Ac is an acidic group selected from the group consisting of --COOH, --SO.sub.3 H, --SO.sub.2 NR.sup.9 R.sup.10 with R.sup.9 and R.sup.10 independently being selected from hydrogen and alkyl; and when X is phenylene, Ac can also be OH. The copolymer contains about 20 to 70 mol % of unit D which has the formula ##STR4## wherein Ci is selected from the group consisting of Ci-1, Ci-2, Ci-3 and Ci-4 which are represented by the following formulae ##STR5## wherein: k, m and n are integers independently selected from 0 to 5, R.sup.3, R.sup.4 and R.sup.7 are independently selected from the group consisting of alkyl, alkoxy, --COOR.sup.8, --NR.sup.9 R.sup.10, --NH--CO--CH.sub.3, halogen, and cyano, R.sup.8 is selected from hydrogen and alkyl, R.sup.9 and R.sup.10 are independently selected from hydrogen and alkyl, R.sup.5 is selected from the group consisting of hydrogen, alkyl, aryl and aralkyl, R.sup.6 is selected from the group consisting of alkyl, aryl and aralkyl and Y is selected from the group consisting of alkylene, arylene and arylenealkylene. The copolymer contains about 0 to 50 mol % of unit E which has the formula ##STR6## wherein R.sup.2 is selected from the group consisting of alkyl, aryl and aralkyl groups.

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Patent Owner(s)
Patent Owner | Address | |
---|---|---|
EASTMAN KODAK COMPANY | 343 STATE STREET ROCHESTER NY 14650-2201 |
International Classification(s)

- [Classification Symbol]
- [Patents Count]
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Baumann, Harald | Osterode/Harz, DE | 87 | 369 |
Flugel, Michael | Osterode/Harz, DE | 14 | 62 |
Kottmair, Eduard | Ebenhausen, DE | 9 | 25 |
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Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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