Method of introducing organic and inorganic grafted compounds throughout a thermoplastic polishing pad using a supercritical fluid and applications therefor
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 22, 2003
Grant Date -
N/A
app pub date -
Nov 29, 2001
filing date -
Nov 29, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The present invention is directed, in general, to a polymer with altered properties to make the pad more suitable for use in customized semiconductor, in particular, shallow trench isolation chemical mechanical polishing applications. A method of preparing such polymers comprises exposing a plastic substrate to a supercritical fluid containing a precursor. By virtue of the reactive environment provided by the supercritical fluid, the precursor is grafted throughout the plastic, thereby changing its bulk properties. A wide variety of grafted compounds, including inorganic, wetability and inorganic-organic compounds, may thus be incorporated into the plastic to form a new polymer endowed with new set of favorable polishing properties.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully