Method of regulating a high temperature gaseous phase process and use of said method
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United States of America Patent
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Jul 22, 2003
Grant Date -
N/A
app pub date -
Oct 5, 2001
filing date -
Feb 10, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of regulating a high temperature gas phase process on the basis of a measurement curve determined by means of infrared spectroscopy, the curve having at least one spectral peak which is characteristic for the regulation of the process and which deviates from a background of the measurement curve. A straight line synthetic background is calculated directly from the measurement curve on the basis of initial and end values of the characteristic spectral peak, and the peak is integrated over the straight line, or a maximum height of the peak over the straight line, or another characteristic value of the peak relative to the straight line is utilized. The process is regulated based on measured peak and the synthetic background.
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