Method and device for simultaneous arc processing and chemical etching
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United States of America Patent
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Jul 22, 2003
Grant Date -
Aug 15, 2002
app pub date -
Feb 9, 2001
filing date -
Feb 9, 2001
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Abstract
The present invention relates to an arc processing method and device with simultaneous chemical etching wherein the device comprises a conductive electrode, being the cathode, an auxiliary electrode, being the anode, an conductive fluid, and an non-conductive work piece for processing. Processing, and precision processing in particular, of non-conductive materials is obtained by simultaneous arc discharge and etching that are brought about by chemical reactions associated with cathode and anode. Moreover, the present invention discloses simultaneous arc processing and chemical etching that offers improved processing efficiency over conventional arc processing.
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