Dual collimated deposition apparatus and method of use
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United States of America Patent
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Jul 15, 2003
Grant Date -
N/A
app pub date -
Aug 4, 1998
filing date -
Aug 4, 1998
priority date (Note) -
Expired
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Abstract
A dual collimation deposition apparatus and method are disclosed in which the dual collimation apparatus includes at least a long-throw collimator in combination with one or more physical collimators. A new physical collimator and shield design are also disclosed for improved process uniformity and increased equipment productivity.
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