Substrate processing apparatus and substrate processing method
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United States of America Patent
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Jun 24, 2003
Grant Date -
N/A
app pub date -
Jan 25, 2000
filing date -
Jan 26, 1999
priority date (Note) -
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Abstract
A substrate processing apparatus includes a rotation accommodating shelf and a transfer machine. The rotation accommodating shelf is capable of accommodating a plurality of accommodating containers in which substrates are to be loaded. The transfer machine is for transferring the plurality of accommodating containers to the rotation accommodating shelf. The plurality of accommodating containers are respectively disposed on radial lines, which radiate from a rotation center of the rotation accommodating shelf, such that each accommodating container is respectively inclined in a horizontal plane in a same fixed direction with respect to a radial line.
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