Pad for use in a critical environment
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United States of America Patent
Stats
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Jun 17, 2003
Grant Date -
Sep 19, 2002
app pub date -
Mar 13, 2001
filing date -
Mar 13, 2001
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A cleaning/polishing pad has a first surface with raised, substantially nubs, having a length greater than a width, arranged adjacent each other forming laterally alternating rows of nubs and having troughs interspersed therebetween, a second surface opposite the first surface, and a thickness. The troughs, which may contain polishing/cleaning chemicals, are divided into first and second groups of substantially parallel troughs. The groups of troughs are arranged at an angle to one another forming a hatch pattern. The pad can be formed to make roller brushes, circular brushes or manual wipes. For the circular brushes the nubs are arranged adjacent each other forming laterally alternating concentric circles of nubs. Micropores are interspersed within the pad having a gradient of pores with smaller pores towards the first surface and larger pores towards the second. There are no sharp edges or corners in/on the pad.
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