Reflective spectral filtering of high power extreme ultra-violet radiation

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United States of America Patent

PATENT NO 6577442
APP PUB NO 20030058529A1
SERIAL NO

09965170

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Abstract

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In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

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Patent Owner(s)

Patent OwnerAddress
SIEMENS WESTINGHOUSE POWER CORPORATIONMC 301 4400 ALAFAYA TRAIL ORLANDO FL 32826

International Classification(s)

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  • 2001 Application Filing Year
  • F21V Class
  • 974 Applications Filed
  • 267 Patents Issued To-Date
  • 27.42 % Issued To-Date

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Goldstein, Michael Ridgefield, CT 110 1445

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  • 3 Citation Count
  • F21V Class
  • 1.16 % this patent is cited more than
  • 22 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges3102693522873121501 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +05101520253035404550556065707580859095100105110

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