Ammonium salt of organic acid and resist composition containing the same
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United States of America Patent
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Jun 3, 2003
Grant Date -
Jul 4, 2002
app pub date -
Mar 9, 2001
filing date -
Dec 28, 2000
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Abstract
The present invention provides a novel ammonium salt of an organic acid. When the salt is used as a base additive for a chemically amplified resist, the environmental stability of the resist can be enhanced, and the T-top phenomenon can be effectively prevented. In addition, the line width change caused by acid diffusion can be prevented, and the E.sub.0 value of the resist can be decreased.
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