Star pinch X-ray and extreme ultraviolet photon source
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United States of America Patent
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May 20, 2003
Grant Date -
Dec 12, 2002
app pub date -
Jun 7, 2001
filing date -
Jun 7, 2001
priority date (Note) -
Expired
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Abstract
A source of photons includes a discharge chamber, first and second groups of ion beam sources in the discharge chamber and a neutralizing mechanism. Each of the ion beam sources electrostatically accelerates a beam of ions of a working gas toward a plasma discharge region. The first group of ion beam sources acts as a cathode and the second group of ion beam sources acts as an anode for delivering a heating current to the plasma discharge region. The neutralizing mechanism at least partially neutralizes the ion beams before they enter the plasma discharge region. The neutralized beams and the heating current form a hot plasma that radiates photons. The photons may be in the soft x-ray or extreme ultraviolet wavelength range and, in one embodiment, have wavelengths in a range of about 10-15 nanometers.
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