Methods of producing substantially anatase-free titanium dioxide with silicon halide addition
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United States of America Patent
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May 13, 2003
Grant Date -
Aug 22, 2002
app pub date -
Feb 20, 2001
filing date -
Feb 20, 2001
priority date (Note) -
Expired
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Abstract
The present invention provides methods of producing substantially anatase-free titanium dioxide by mixing titanium tetrachloride with a silicon compound to form an admixture, and introducing the admixture and oxygen into a reaction zone to produce the substantially anatase-free titanium dioxide. The reaction zone has a pressure of greater than 55 psig.
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