Injection seeded F2 laser with centerline wavelength control
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United States of America Patent
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Apr 29, 2003
Grant Date -
Dec 12, 2002
app pub date -
May 14, 2001
filing date -
Sep 27, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention provides a narrow band laser system having two laser subsystems. The first laser subsystem is configured to provide a very narrow band pulsed output beam which is used to injection seed the second laser subsystem where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply is provided which is specially configured to precisely time the discharges in the two laser subsystem so that the discharges are properly synchronized. The laser gas comprises F.sub.2 at a partial pressure less than about 1% with a buffer gas comprised of helium or neon or a combination of helium and neon. Control of center wavelength of the output beam is provided by adjusting one or more of the following parameters in the first laser: the total laser gas pressure, the relative concentration of helium or neon, F.sub.2 partial pressure, laser gas temperature, discharge voltage and pulse energy.
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