Cathode rinsing station and method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Apr 15, 2003
Grant Date -
N/A
app pub date -
Feb 2, 2000
filing date -
Feb 2, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A cathode station (10) for a pipe electrochemical polishing system (12) has a valve (20) for preventing a cleaning fluid (56) from entering into a pipe (28). A cathode (14) is pulled into the cathode station (10) by a cathode puller cable (16) after a polishing operation (62) is completed. In a rinse cathode operation (66) the cleaning fluid (56) is introduced into the cathode station (10) through a fluid inlet (52) and removed from a fluid outlet (54). In a finish operation (68) the cathode (14) and cathode station (10) are removed from the pipe electrochemical polishing system (12).
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