Adsorbent gas scrubber to dispose the gas generated during the semiconductor manufacturing process
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United States of America Patent
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Apr 8, 2003
Grant Date -
N/A
app pub date -
Mar 25, 1999
filing date -
Mar 25, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An adsorbent gas scrubber is provided in which the processing efficiency of the gas generated during semiconductor manufacturing can be increased, as the idle time of the system is reduced. The above mentioned object and other objects are accomplished by an adsorbent gas scrubber in accordance with aspects of the present invention which comprise an induction tube being connected to a gas inlet attached with a first pressure gauge for measuring a pressure of the entered gas, and an adsorbent case placed adjacent to the induction tube. The adsorbent case contains a layered arrangement of multiple catalytic-adsorbent members which adsorb the gas that flows from the induction tube to a gas outlet attached with a second pressure gauge for measuring pressure of the processed gas being discharged. A series of gas passage tubes placed at the bottom portion of the induction tube and the adsorbent case supply gas to the catalytic-adsorbent members. A gas passage means controls the flow of gas that comes in from the induction tube such that the gas is either allowed to or blocked from flowing into each catalytic-adsorbent members placed in the adsorbent case, based on the pressure difference between the first pressure gauge and the second pressure gauge.
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