Method for determining magnification error portion of total misalignment error in a stepper
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United States of America Patent
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Apr 1, 2003
Grant Date -
N/A
app pub date -
Oct 21, 1999
filing date -
Oct 21, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for determining magnification error portion of total misalignment error in a stepper. In one embodiment, the method comprises a series of steps in a stepper, starting with the step of receiving a wafer, having a first pattern and an error-free fine alignment target, in the stepper. In another step, the wafer is aligned in the stepper using the error-free fine alignment target. Then a second pattern is created on the wafer overlaying said first pattern. In another step, the magnification error portion of the total misalignment error is determined by measuring the radial misalignment between the first pattern and the second pattern.
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