Polymer with a pericyclic protective group and resist composition containing the same
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United States of America Patent
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Mar 25, 2003
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N/A
app pub date -
Feb 28, 2000
filing date -
Feb 28, 2000
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Abstract
The present invention relates to a polymer with at least one pericyclic protective group such as 2-methyl-2-bicyclo[2,2,1]heptanyl. The resist composition containing the polymer can be used as a chemically amplified resist and exhibits strong etch resistance. In addition, a line-and-space pattern of 0.1 .mu.m pitch can be resolved successfully using the resist composition.
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