Resist residue remover
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United States of America Patent
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Mar 18, 2003
Issued Date -
N/A
app pub date -
Aug 9, 2000
filing date -
Dec 9, 1998
priority date (Note) -
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Abstract
The invention provides a nontoxic, undangerous resist residue remover that enables removal of resist residues to be carried out without metal corrosion or other problems and with safety. The remover is an aqueous solution containing ammonium phosphate and/or condensed ammonium phosphate and having a pH ranging from 1 to 10.
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